University of California College of Engineering Department of Electrical Engineering and Computer Sciences
University of California College of Engineering Department of Electrical Engineering and Computer Sciences
University of California College of Engineering Department of Electrical Engineering and Computer Sciences
College of Engineering
Department of Electrical Engineering and Computer Sciences
Prof. Chenming Hu
502 Cory Hall, (510) 642-3393, hu @eecs.berkeley.edu
T.A.s:
Anupama Bowonder, bowonder@eecs.berkeley.edu
TBA
LECTURES
Tuesday and Thursday – 3:30 to 5:00pm in 3106 Etcheverry
DISCUSSIONS
Section 101 Wednesday 8-9am, 247 Cory
Section 102 – Thursday 5-6pm, 289 Cory
Each student must attend one of these sections. T.A.s will review important concepts covered in
the lectures, lead the discussion of homework, work through sample problems, and present
supplementary materials.
OFFICE HOUR
Professor Hu: Tuesday 5-6pm, 502 Cory Hall (Office Hour)
Wednesday 5:30-6:30, Hogan Room, 535 Cory Hall (Question/Answer Session)
Anupama: TBA
TEXT
Reader for purchase at Copy Central @ 2483 Hearst Ave. (near Euclid)
COURSE OBJECTIVE
a. To develop a physical understanding of three important devices: the pn junction, the
MOS transistor, and the bipolar transistor.
b. To explore the general skills for analyzing and designing semiconductor devices.
PREREQUISSITES
EECS 40 or EECS 100: Simple pn-junction and MOSFET theory and MOSFET circuit
applications. It is assumed that the students know the concept of energy levels in hydrogen atoms.
CONTENTS:
A. Review of Semiconductor Properties (2 weeks)
Bond picture, electrons, holes, band picture, density of states, electron statistics,
Fermi level, mobility, diffusion, and recombination.
B. Fabrication Technology (1 week)
Crystal growth, thermal oxidation, lithography and pattern transfer, dopant addition
and diffusion, and chemical vapor deposition.
C. PN Junction (3 weeks)
Field and potential in step PN junctions, minority and majority currents, junction
capacitance, device model, SCL generation and recombination current.
D. MOS Devices (4 weeks)
MOS diodes, flat-band, enhancement, depletion, inversion, CCS, MOSFET I-V
characteristics, speed, device model, MOS technology, memory, and CMOS.
E. Metal-Semiconductor Contact (1 week)
Energy diagram at interface, I-V characteristics, ohmic contact.
F. Bipolar Transistor (3 weeks)
Structure and operation, emitter and base efficiencies, current gain, transit time,
device model, built-in field, regions of operations, Ebers-Moll model, IC transistors.