Laser Ablation or Laser Vaporization

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Laser Ablation or Laser

Vaporization
schematic
2. LASER VAPOURIZATION  A pulsed or continuous laser is
used to vaporize a graphite
target in an oven
at 1200oC.
 Oven is filled with He or Ar gas
to keep the pressure at 500 Torr
A hot vapor plume forms,
expands and then cools
 As the vapor species cool,
small carbon molecules and
atoms condense to form clusters
 Catalysts also begin to
condense and attach to C
clusters to prevent them from
closing.
 Until no longer C can diffuse
 Contaminants like MWCNTS are also formed over the catalyst, SWCNTS grow.
 With pure graphite electrodes, MWCNTS
 With a mixture of graphite with Co, Ni, Fe or Y – SWCNTS.
 eg. Ni:Co (4.2 :1) catalyst and a pulsed laser at 1470oC, SWCNTs
1.3-1.4 nm are obtained
 Better than arc method – higher yield.
ULTRA FAST PULSED LASER – free electron laser – pulse width
400 fs, pulse repetition rate – 75 MHz . The Intensity reaches
5 x 1011 W/cm-2 which is 1000 times greater than Nd:YAG
 A jet of preheated (1000oC) Ar through a nozzle tip is
situated close to the rotating graphite target, which contains
the catalyst.
 The Ar deflects the ablation plume 90o away from the
incident FEL beam direction, cleaning away the carbon vapour A CW laser method can also b
from the region in front of the target. used
 The SWCNT is collected in a cold finger, Laser ablation of mixed graph
 YIELD – 1.5 gh-1 and metallic catalyst by a 2kW
CW CO2 laser in Ar or N2

USE OF MICRON SIZED


PARTICLES
Thermal conductivity losses
are decreased.

YIELD – 5 gh-1

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