Laser Ablation or Laser Vaporization
Laser Ablation or Laser Vaporization
Laser Ablation or Laser Vaporization
Vaporization
schematic
2. LASER VAPOURIZATION A pulsed or continuous laser is
used to vaporize a graphite
target in an oven
at 1200oC.
Oven is filled with He or Ar gas
to keep the pressure at 500 Torr
A hot vapor plume forms,
expands and then cools
As the vapor species cool,
small carbon molecules and
atoms condense to form clusters
Catalysts also begin to
condense and attach to C
clusters to prevent them from
closing.
Until no longer C can diffuse
Contaminants like MWCNTS are also formed over the catalyst, SWCNTS grow.
With pure graphite electrodes, MWCNTS
With a mixture of graphite with Co, Ni, Fe or Y – SWCNTS.
eg. Ni:Co (4.2 :1) catalyst and a pulsed laser at 1470oC, SWCNTs
1.3-1.4 nm are obtained
Better than arc method – higher yield.
ULTRA FAST PULSED LASER – free electron laser – pulse width
400 fs, pulse repetition rate – 75 MHz . The Intensity reaches
5 x 1011 W/cm-2 which is 1000 times greater than Nd:YAG
A jet of preheated (1000oC) Ar through a nozzle tip is
situated close to the rotating graphite target, which contains
the catalyst.
The Ar deflects the ablation plume 90o away from the
incident FEL beam direction, cleaning away the carbon vapour A CW laser method can also b
from the region in front of the target. used
The SWCNT is collected in a cold finger, Laser ablation of mixed graph
YIELD – 1.5 gh-1 and metallic catalyst by a 2kW
CW CO2 laser in Ar or N2
YIELD – 5 gh-1