Nevertheless, atomic layer deposition (ALD) can be proposed as a new attractive alternative.
The use of ALD to improve the corrosion protection of metals has been under intensive study in the past few years.(14-17) In this study, a coating was formed by a first [AI.sub.2][O.sub.3] layer, and a secondary [TiO.sub.2] coating was applied with the aim of using the [AI.sub.2][O.sub.3] as an adhesion promoter and a highly resistive layer(18) and protecting its chemical integrity using the high stability and low wettability(19) of the amorphous [TiO.sub.2] second layer.
Square 10 X 10 cm samples were then obtained and were used for ALD and surface characterization.
The ALD coating was deposited by Beneq Oy (Finland) using a TFS 500 instrument.
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