Physics of Solid State Devices

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Physics of solid state devices


Short introduction to the principles of
operation
Solid state physics terminology
Energy bands instead of atomic energy levels (bands
are broadened levels)
Conduction and valence bands, forbidden band (band
gap)-> insulators, semiconductors, and metals
Fermi level determining the type of charge carriers in
semiconductors: electrons (n-type) or holes (p-type)
Contacts of two semiconductors (p-n junctions) or
metal and a semiconductor; built in electric fields
Defects, trapping, recombination, charge carrier
collection, devices
Quantized energy states
The electrons in free atoms can will be found in only certain
discrete energy states
These states are associated with the orbits or shells of electrons
in an atom, e.g., a hydrogen atom
Energy level splitting in molecules
Wave
function
1 energy level
Splits into 2 levels when atoms are brought together
Potential
well
Atomic levels become bands
band
In solids, atomic
energy levels
broaden to form
energy bands
Different atomic
levels form
different bands
Brining multiple atoms together results in further level splitting
When levels start overlap they form energy bands
Terminology and classification
of solids
Conduction
band
Valence band
Forbidden band (gap)
Valence band is the highest band filled with
electrons, no empty states at T=0
Conduction band is the lowest fully empty, no
electrons at T=0
G=3-5 eV
Dielectrics
G~1 eV,
Semiconductors
Bands overlap
No gap
Metals
2
Example: Sodium band structure
Sodium has 11 electrons, its outer shell is half full (1 electron in s band)
It is easy for electrons in the valence band to be excited into empty higher
energy states of conduction band
Sodium conducts electricity well since there is no band gap
(s band: max 2
electrons)
(p band: max 6
electrons)
3p
Pauli principle and Fermi energy
Pauli: Not more than 2 electrons (with opposite spins) per state
Bucket of N >>1 electrons
To distribute in band states
Fermi level (energy)
All states below E
F
are filled with electrons
All states above E
F
are empty
(at zero T)
E
F

Doping of semiconductors: n-type
A very small number of atoms of a
group V element, e.g., arsenic As,
are added to the silicon Si (group
IV element) as substitutional atoms
Additional valence electrons are
introduced into the material
because each As atom has 1 extra
valence electron
These additional electrons are
bound only weakly to their parent
impurity atoms
even at very low temperature they can
be promoted into the conduction band
of the semiconductor
Doping of semiconductors: p-type
A very small number of atoms of
a group III element, e.g., gallium
Ga, are added to the silicon Si
(group IV element) as
substitutional atoms
There will be a deficit in the
number of valence electrons in
the material
This introduces electron-
accepting levels just above the
top of the valence band
even at very low temperature they
can be promoted into the conduction
band of the semiconductor
Fermi level in semiconductors
Position of Fermi level is
related to the type of
semiconductor: close to
CB for n type, close to
VB for p type
E
F

E
F

E
F

Intrinsic
p type
n type
Brining two material in contact: metals
Electrons move to the material where their energy is
lower, leaving unbalanced positive charge behind
Similar to flat-plate capacitor: built-in electric field
1 2
contact
V
e
u u
=
3
Brining two material in contact:
p-n junctions
In p-type semiconductor
holes are created by
negatively charged acceptor
impurities
In n-type, conduction
electrons are donated by
positively charged donors
At a pn junction holes
diffuse from the p side, and
electrons from the n side,
creating charges of opposite
sign on both sides and thus
creating a built-in electric
field (bands are tilted)
No free carriers
p-n junction under reverse bias
To reverse-bias the p-n
junction, the p side is made
more negative
This increases the built-in
electric field, improving
separation and collection of
charges produced by radiation
The depletion width (sensitive
region) is also increased
Most often used in radiation
detection as it improves signal
to noise ratio
Reverse
bias
Current-voltage characteristics
of p-n junction
Diode I-V curve
Useful part typically
from 3 to 3V
Breakdown voltage
is not readily
predicted (10-30 V in
different diodes)
|
|
.
|

\
|
= 1
kT
qV
s
e I I
q
Example: Bipolar transistor
Device structure: two p-n
junctions connected back-to-
back
Voltage applied to the base
determines the current
between emitter and
collector; exponential
amplification due to change
in barrier height
It is called bipolar because
both electrons and holes
carry current in the device
Can occur in either npn or
pnp configurations
1956 Nobel prize in physics for
invention of a transistor by
Bardeen, Brattain, and Shockley
Example: MOSFET
Metal oxide-semiconductor field effect transistor
Same principle of operation (gate ~ base)
Simplified fabrication
insulator
Example: TLD
Radiation excites electron into CB; to lower its energy it
move into a trap (metastable defect state)
After heating electron acquires energy to get back to CB
Recombination with a hole from VB results in energy
release emitted as optical photon
VB
CB
Incident
radiation
Electron trap
(metastable
state)
-
VB
CB
Thermo-
luminescen
t photon
Electron trap
(metastable
state)
-

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