Course Name Ic Fabrication Course Description

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Course Name IC FABRICATION

This elective course deals with the concepts involved in the fabrication and
Course Description manufacturing of discrete semiconductor device and integrated circuits (IC) toward
analog and digital logic applications. It starts with semiconductor principles,
historical account and trending on integrated circuit manufacturing, microchip
fabrication processes and IC packaging. Also included are different IC packages of
digital logic families such as TTL, I2L, ECL and the recent CMOS, NMOS and PMOS
technologies and analog devices.
Number of Contact Hours 3 units lecture
per week
Number of Contact Hours 3 hours lecture
per Week
Prerequisite Electronics Devices and Circuits
Course Objectives After completing this course, the student must be able to:
1. General:
This course will give the student knowledge of the nature of work in the
semiconductor industry and how semiconductor devices are designed and
manufactured.

Specific:
1. Differentiate semiconductor with conductor and insulator by its atomic
structure, quantum number and energy level.
2. Differentiate extrinsic from intrinsic semiconductors.
3. Relate Moore’s Law on trending in IC manufacturing.
4. Integrate factors such as cost and power consumption on IC manufacturing
5. Explain how planar process is done on microchip fabrication from crystal
growth to wafer test and evaluation.
6. Identify the latest technologies involve in IC fabrication for different IC
packages.
1. Principles of Semiconductor
1.1 Atomic Structure
1.2 Semiconductor, Conductor, Insulator
Course Outline 1.3 Energy Level. Quantum Numbers
1.4 Extrinsic and Intrinsic Semiconductor
1.5 Structure of Crystal
1.6 Crystal Defects
1.7 Miller Indices
2. Intro to IC Manufacturing
2.1 Evolution of Semiconductor Manufacturing
2.2 Moore’s Law
2.3 Issues on Power Consumption
2.4 IC Cost
3. Microchip Fabrication Process: Planar Process
3.1 Crystal Growth and Wafer Preparation
3.2 Oxidation: Grove & Deals Model for Oxidation
3.3 Photolithography/Photo masking
3.4 Doping: Diffusion and Ion Implantation
3.5 Chemical Vapor Deposition
3.6 Physical Vapor Deposition: Evaporation and Sputtering
3.7 Metallization
3.8 Wafer Test and Evaluation/ Contamination Control
4. IC Packaging
a. IC Packages
b. Digital Logic Families
c. NMOS and PMOS Technologies
d. Analog MOS Devices
e. Memories
Laboratory Equipment None

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