Diode Animation
Diode Animation
Diode Animation
Intrinsic Semiconductor
Semiconductor in pure form is known as Intrinsic Semiconductor. Ex. Pure Germanium, Pure Silicon. At room temp. no of electrons equal to no. of holes. Fig 1.
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Si
Si
FREE ELECTRON
Si
Si
Si
Si
HOLE
Si
Si
Si
Energy in ev
FERMI LEVEL
Valence Band
Extrinsic Semiconductor
When we add an impurity to pure semiconductor to increase the charge carriers then it becomes an Extrinsic Semiconductor. In extrinsic semiconductor without breaking the covalent bonds we can increase the charge carriers.
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Comparison of semiconductors
Intrinsic Semiconductor
1. It is in pure form.
Extrinsic Semiconductor
1. It is formed by adding trivalent or pentavalent impurity to a pure semiconductor. 2. No. of holes are more in ptype and no. of electrons are more in n-type.
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(Cont.,)
3. Fermi level lies in between valence and conduction Bands. Ratio of majority and minority carriers is unity. 3. Fermi level lies near valence band in p-type and near conduction band in n-type. 4. Ratio of majority and minority carriers are equal.
4.
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P-type
Trivalent impurities are added. Majority carriers are holes. Minority carriers are electrons. Fermi level is near the valence band.
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N-type Semiconductor
As
Fig 1.
N-type Pure Si si
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N-type Semiconductor
Arsenic atom has 5 valence electrons. Fifth electron is superfluous, becomes free electron and enters into conduction band. Therefore pentavalent impurity donates one electron and becomes positive donor ion. Pentavalent impurity known as donor.
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P-type Semiconductor
When we add a Trivalent impurity to pure semiconductor we get p-type semiconductor.
Ga
Fig 2.
P-type Pure Si si
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P-type Semiconductor
Gallium atom has 3 valence electrons. It makes covalent bonds with adjacent three electrons of silicon atom. There is a deficiency of one covalent bond and creates a hole. Therefore trivalent impurity accepts one electron and becomes negative acceptor ion. Trivalent impurity known as acceptor.
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Acceptor ion
Donor ion
+ + +
+ + +
+ +
+ + +
Minority electron
Majority holes
Majority electrons
Minority hole
Fig 3.
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Comparison of semiconductors
Intrinsic Semiconductor
1. It is in pure form.
Extrinsic Semiconductor
1. It formed by adding trivalent or pentavalent impurity to a pure semiconductor.
2. No. of holes are more in p2. Holes and electrons are type and no. of electrons are equal. more in n-type. 3. Fermi level lies in between valence and conduction Bands. 3. Fermi level lies near valence band in p-type and near conduction band in n-type.
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Conduction in Semiconductors
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Drift process
A CB VB B
Fig 4.
Electrons move from external circuit and in conduction band of a semiconductor. Holes move in valence band of a semiconductor.
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Diffusion process
Moving of electrons from higher concentration gradient to lower concentration gradient is known as diffusion process.
X=a
Fig 5.
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P Minority electron
Acceptor ion
Donor ion
N + + + + +
+ + +
+ + +
Majority holes
Majority electrons
Minority hole
Fig 1.
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Formation of pn diode
Depletion Region P + + + + + + N + + + + +
Fig 2.
Potential barrier
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Vb
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Formation of pn diode
A P-N junction is formed , if donor impurities are introduced into one side ,and acceptor impurities Into other side of a single crystal of semiconductor
Initially there are P type carriers to the left side of the junction and N type carriers to the right side as shown in figure 1
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On formation of pn junction electrons from nlayer and holes from p-layer diffuse towards the junction and recombination takes place at the junction.
And leaves an immobile positive donor ions at nside and negative acceptor ions at p-side.
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Formation of pn diode
A potential barrier develops at the junction whose voltage is 0.3V for germanium and 0.7V for silicon.
Then further diffusion stops and results a depletion region at the junction.
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Depletion region
Since the region of the junction is depleted of mobile charges it is called the depletion region or the space charge region or the transition region.
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Potential barrier
Forward Bias
An ext. Battery applied with +ve on p-side, ve on nside. The holes on p-side repelled from the +ve bias, the electrons on n- side repelled from the ve bias . The majority charge carriers driven towards junction. the
This results in reduction of depletion layer width and barrier potential. As the applied bias steadily increased from zero onwards the majority charge carriers attempts to cross junction.
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Holes from p-side flow across to the ve terminal on the n-side, and electrons from n-side flow across to the +ve terminal on the p-side. As the ext. bias exceeds the Junction barrier potential (0.3 V for Germanium, 0.7 V for Silicon ) the current starts to increase at an exponential rate. Now, a little increase in forward bias will cause steep rise in majority current. The device simply behaves as a low resistance path.
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Features:
Behaves as a low resistor. The current is mainly due to the flow of majority carriers across the junction. Potential barrier, and the depletion layer is reduced
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Current components
Potential barrier
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Few hole-electron pairs are created due to thermal agitation (minority carriers). As a result small current flows across the junction called as reverse saturation current I0 (uA for Germanium, nA for Silicon). Behaves as a high impedance element.
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Further rise in reverse bias causes the collapse of junction barrier called breakdown of the diode. This causes sudden increase in flow of carriers across the junction and causes abrupt increase in current.
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P-N JUNCTION
Fig 1.
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JUNCTION PROPERTIES
1. The junction contains immobile ions i.e. this region is depleted of mobile charges. This region is called the depletion region, the space charge region, or transition region. It is in the order of 1 micron width. The cut-in voltage is 0.3v for Ge, 0.6v for Si.
2.
3. 1.
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Fig 2.
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(Contd)
IF(mA) Breakdown voltage
Forward bias
VF(V)
Fig 3.
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Diode Current
The expression for Diode current is
I = I 0 (e 1)
Where Io=Reverse Saturation current. V=Applied Voltage. Vt=Volt equivalent temperature=T(K)/11600. n=1 for germanium and 2 for silicon.
V n Vt
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Resistance calculation
IF(mA) Breakdown voltage
If
Forward bias
VR(V)
Vr
Ir
Fig 4.
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Resistance calculation
Forward Resistance
1. Dynamic resistance (rf)= V/ I ..ohms.
Where V, I are incremental voltage and current values on Forward characteristics. 2. Static resistance (Rf)= Vf /If ohms. Where Vf, If are voltage and current values on Forward characteristics.
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(Contd..)
Reverse Resistance:
Static resistance = Vr /Ir ohms
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Diode-Variants
Rectifier diodes: These diodes are used for AC to DC conversion Over voltage protection. Signal diodes : Detection of signals in AM/FM Receivers. Zener diode: Voltage Regulation purpose. Varactor diode for variable capacitance Electronic tuning commonly used in TV receivers.
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(contd)
Light Emitting Diodes (LED) : Display Light source in Fiber optic comm. Photo diodes : Light detectors in Fiber optic comm. Tunnel diode: Negative resistance for Microwave oscillations Gunn diode :Microwave Oscillator. Shottkey diode: High speed Logic circuits
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Semiconductor diodes
Visual - 1
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Diode numbering
First Standard (EIA/JEDEC):
In this approach the semiconductor devices are identified with the no of junctions. 1N series : single junction devices such as P-N junction Diode. e.g.: 1N4001,1N3020. 2N series : Two junction devices such as Transistors. e.g.: 2N2102,1N3904. EIA= Electronic Industries association JDEC=Joint Electron Engineering Council.
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(contd)
Second Standard
In this method devices given with alpha-numeric codes. And each alphabet has a specific information which tells about application, material of fabrication. First Letter: material A=Germanium. B=Silicon. C=Gallium arsenide. R=compound material (e.g. Cadmium sulphide).
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(contd..)
Second Letter: For device type and function
A= Diode. B= Varactor. C= AF Low Power Transistor. D= AF Power Transistor. E= Tunnel Diode. F= HF Low Power Transistor. L= HF Power Transistor. S= Switching Transistor. R= Thyristor/Triac. Y= power device. Z= Zener.
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(contd..)
Examples:
1. 2. AC128: Germanium AF low power Transistor. BC149: Silicon AF low power Transistor.
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(contd)
3. BY114 : Silicon Crystal diode. 4. BZC 6.3 : Silicon Zener diode Vz= 6.3v. 5. BY127 : Silicon rectifier diode.
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Lead Identification:
Commonly the cathode is identified with a band marking a dot marking or with a rounded edge.
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Specifications
1. Peak inverse voltage (PIV)
It is the max. voltage a diode can survive under reverse bias. Max. Forward current (If). It is the maximum current that can flow through the diode under forward bias condition. Reverse saturation current (Io). Amount of current flow through the diode under reverse bias condition.
2.
3.
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Specifications (contd)
4. Max power rating (Pmax). Maximum power that can be dissipated in the diode. 5. Operating Temperature (oC ). The range of temperature over which diode can be operated.
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Applications
1. 2. 3. 4. 5. 6. Rectifier circuits for AC-DC Conversion. Over voltage protection circuits. Limiter, Clamping, voltage doublers circuits. Signal detector in AM/FM Receivers. In transistor bias compensation networks. Digital Logic gates.
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ZENER DIODE
Invented by C.Zener. Heavily doped diode. Thin depletion region. Sharp break down voltage called zener voltage Vz. Forward characteristics are same as pn diode characteristics.
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CIRCUIT SYMBOL
Anode cathode
K A
K A
EQUIVALENT CIRCUIT
In forward bias
Rf
EQUIVALENT CIRCUIT
EQUIVALENT CIRCUIT
RZ
Vz
Vz
Ideal Practical Fig 7. Equivalent circuit of zener diode for voltage above Vz
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Depletion Region
P N
+ + +
+ + +
+ + +
+ +
+ + +
Depletion Region
P N
+ + +
+ + +
+ + +
+ +
+ + +
ZENER BREAKDOWN
Applied field enough to break covalent bonds in the depletion region. Extremely large number of electrons and holes results. Produces large reverse current. Known as Zener Current IZ.
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Depletion Region
P N
+ + +
+ + + +
+ + +
+ + +
carriers
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Depletion Region
P N
+ + +
+ + + +
+ + +
Avalanche of charge carriers
+ + +
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V
Fig 1. zener diode in forward bias
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FORWARD BIAS
CHARACTERSTICS
IF(mA)
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V
Fig 3. Zener diode in Reverse bias
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VR(V)
Vz
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VI CHARACTERISTICS
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