and

593mm

32 40

all with Evatec

process know how
Custom Crucible Options

Electron Beam
Deposition Technology

Pot crucible, volume according to request

4, 6, 8 and 16 pocket variants according to request

From simple Best Known Methods for evaporation of individual materials (BKMs) to

98mm

process specifications with uniformity calculations and system throughputs, Evatec

26mm

offersknow how to help you achieve optimised layer results with your EBS hardware.

160mm

But delivery of the E Gun is just the start, and Evatec delivers complete source and
process control solutions for a wide range of materials and applications.

176

205

118

Crucible

Broadband Optical Monitoring for

process control

Plasma sources for enhanced

layer properties

Extended throw geometries for SAW

About Us

40

Evatec offers complete solutions for thin film deposition and etch in the optical and
semiconductor markets. Evatec engineers are able to offer practical production advice
and solutions from R&D to prototyping and mass production. We recognize that no single
technique offers the solution to all problems. With a technology portfolio including standard

Metals Oxides SAW LEDs MEMS

Power Devices Optics Projection
Display Photovoltaics Sensors

and enhanced evaporation solutions as well as sputter, we are ready to offer sampling services
and custom engineering solutions to meet our customers individual needs.
We provide sales and service through our global network of local offices. For more information
visit us at www.evatecnet.com or contact our head office.

EBS

Evatec Ltd.
Lochrietstrasse 14
CH-8890 Flums
Switzerland
Tel: + 41 81 720 1080
Fax: + 41 81 720 1081
info@evatecnet.com
www.evatecnet.com

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.

E Gun

EBS

An Evatec core competence

EBS500

Better by design

Supreme process control at your finger tips

EBS Design Features

High rates

Electron Beam Gun Deposition is the most common deposition

technology of batch evaporation systems used in the industrial
production of cutting edge optical and semiconductor devices.
The ability to change source configuration and materials quickly

Robust for 24/7 production

combined with its suitability for the widest range of materials

Easy to maintain

continue to make it the most economical method where flexibility

is a must.
As home of the Balzers BAK, Evatec has the benefit of 50 years

Sweep Track Module

defines
Dwell times
Sweep track

DIN EN ISO 9001 certified

experience delivering evaporation solutions, which number over

SWEEP

CE/UL compliant

1200 worldwide. From the simple low cost thermal sources first

EEC Parameter Module

defines
Position
X-size, Y-Size
Speed

developed in the 1960s, right through to todays custom electron

beam gun and effusion cell solutions for complex alloy and codeposition, robust industrial design is always at the heart of our
thinking. Our current EBS Electron Beam Gun hardware solutions
are in use 24/7 around the globe.

Our gun bodies are designed for deposition at high rates in demanding

Benefits of Electron Beam Gun

Evaporation Technology

Complex materials
Multi material stacks
Co-deposition
Curved substrate geometries
Plasma assist for enhanced layers

EEC 500

production environments and driven by thelatest generation EEC500 control

Coil Power Supply andEFS Filament Current Power Supply complete the

TEST
100.0

Speedfactor
X-Size

[%]

Sweep Duration

Filament

Times [ms]

full two dimensional beam sweep control over fixed and rotating

ECS

crucibles in a 16 X 16 spot track grid. Sweep track modules stored

EFS

within the EEC500 control sweep path as well as dwell times for

In the case of multi gun systems, each source has its own Deflector Coil

each spot in the grid. Additional Parameter Modules control beam

and Filament supplies but one EHV500 can power up to three sources and

shape/ focus, position and speed giving the user complete freedom

multi source and master / slave operation modes for the EEC allow it to

EHV500

to define material dependent parameter sets. A common base plate

control different source types and quantities. Our systems are engineered

with direct water cooling allows simple exchange between different

to control not only the latest generation gun bodies but also the robust

crucible arrangements adding further flexibility.

ESQ100 series gun bodies which remain industry favourites for many optical
and semiconductor applications. Custom retrofit packages of control
systems and gun bodies are available to give your existing BAK a new lease
of life.
Integration via Ethernet (HSMS SECS Protocol) allows the user full access
and control of the EEC from the Khan system and Process Controller.

Full integration within Evatecs Khan control platform makes for

simple selection of parameter sets by application engineers and
operators alike. Simultaneous source control for co deposition
and continuous source fed systems for are just a few of the custom
hardware solutions available to meet your production requirements.

100
100.0
Sweep Track

0.465
0.435
0.405
0.375
0.345
0.315
0.285
0.255
0.225
0.195
0.165
0.135
0.105
0.075
0.045
0.000

Speed factor:100

The ESQ212 series gun bodies developed for the EBS500 permit

unit and EHV500 10KV solid state power supplies. The ECS Deflector
package.

Versatile

Sweep track set

Y-Size

Filament

[%]

E Gun

EBS

An Evatec core competence

EBS500

Better by design

Supreme process control at your finger tips

EBS Design Features

High rates

Electron Beam Gun Deposition is the most common deposition

technology of batch evaporation systems used in the industrial
production of cutting edge optical and semiconductor devices.
The ability to change source configuration and materials quickly

Robust for 24/7 production

combined with its suitability for the widest range of materials

Easy to maintain

continue to make it the most economical method where flexibility

is a must.
As home of the Balzers BAK, Evatec has the benefit of 50 years

Sweep Track Module

defines
Dwell times
Sweep track

DIN EN ISO 9001 certified

experience delivering evaporation solutions, which number over

SWEEP

CE/UL compliant

1200 worldwide. From the simple low cost thermal sources first

EEC Parameter Module

defines
Position
X-size, Y-Size
Speed

developed in the 1960s, right through to todays custom electron

beam gun and effusion cell solutions for complex alloy and codeposition, robust industrial design is always at the heart of our
thinking. Our current EBS Electron Beam Gun hardware solutions
are in use 24/7 around the globe.

Our gun bodies are designed for deposition at high rates in demanding

Benefits of Electron Beam Gun

Evaporation Technology

Complex materials
Multi material stacks
Co-deposition
Curved substrate geometries
Plasma assist for enhanced layers

EEC 500

production environments and driven by thelatest generation EEC500 control

Coil Power Supply andEFS Filament Current Power Supply complete the

TEST
100.0

Speedfactor
X-Size

[%]

Sweep Duration

Filament

Times [ms]

full two dimensional beam sweep control over fixed and rotating

ECS

crucibles in a 16 X 16 spot track grid. Sweep track modules stored

EFS

within the EEC500 control sweep path as well as dwell times for

In the case of multi gun systems, each source has its own Deflector Coil

each spot in the grid. Additional Parameter Modules control beam

and Filament supplies but one EHV500 can power up to three sources and

shape/ focus, position and speed giving the user complete freedom

multi source and master / slave operation modes for the EEC allow it to

EHV500

to define material dependent parameter sets. A common base plate

control different source types and quantities. Our systems are engineered

with direct water cooling allows simple exchange between different

to control not only the latest generation gun bodies but also the robust

crucible arrangements adding further flexibility.

ESQ100 series gun bodies which remain industry favourites for many optical
and semiconductor applications. Custom retrofit packages of control
systems and gun bodies are available to give your existing BAK a new lease
of life.
Integration via Ethernet (HSMS SECS Protocol) allows the user full access
and control of the EEC from the Khan system and Process Controller.

Full integration within Evatecs Khan control platform makes for

simple selection of parameter sets by application engineers and
operators alike. Simultaneous source control for co deposition
and continuous source fed systems for are just a few of the custom
hardware solutions available to meet your production requirements.

100
100.0
Sweep Track

0.465
0.435
0.405
0.375
0.345
0.315
0.285
0.255
0.225
0.195
0.165
0.135
0.105
0.075
0.045
0.000

Speed factor:100

The ESQ212 series gun bodies developed for the EBS500 permit

unit and EHV500 10KV solid state power supplies. The ECS Deflector
package.

Versatile

Sweep track set

Y-Size

Filament

[%]

E Gun

EBS

An Evatec core competence

EBS500

Better by design

Supreme process control at your finger tips

EBS Design Features

High rates

Electron Beam Gun Deposition is the most common deposition

technology of batch evaporation systems used in the industrial
production of cutting edge optical and semiconductor devices.
The ability to change source configuration and materials quickly

Robust for 24/7 production

combined with its suitability for the widest range of materials

Easy to maintain

continue to make it the most economical method where flexibility

is a must.
As home of the Balzers BAK, Evatec has the benefit of 50 years

Sweep Track Module

defines
Dwell times
Sweep track

DIN EN ISO 9001 certified

experience delivering evaporation solutions, which number over

SWEEP

CE/UL compliant

1200 worldwide. From the simple low cost thermal sources first

EEC Parameter Module

defines
Position
X-size, Y-Size
Speed

developed in the 1960s, right through to todays custom electron

beam gun and effusion cell solutions for complex alloy and codeposition, robust industrial design is always at the heart of our
thinking. Our current EBS Electron Beam Gun hardware solutions
are in use 24/7 around the globe.

Our gun bodies are designed for deposition at high rates in demanding

Benefits of Electron Beam Gun

Evaporation Technology

Complex materials
Multi material stacks
Co-deposition
Curved substrate geometries
Plasma assist for enhanced layers

EEC 500

production environments and driven by thelatest generation EEC500 control

Coil Power Supply andEFS Filament Current Power Supply complete the

TEST
100.0

Speedfactor
X-Size

[%]

Sweep Duration

Filament

Times [ms]

full two dimensional beam sweep control over fixed and rotating

ECS

crucibles in a 16 X 16 spot track grid. Sweep track modules stored

EFS

within the EEC500 control sweep path as well as dwell times for

In the case of multi gun systems, each source has its own Deflector Coil

each spot in the grid. Additional Parameter Modules control beam

and Filament supplies but one EHV500 can power up to three sources and

shape/ focus, position and speed giving the user complete freedom

multi source and master / slave operation modes for the EEC allow it to

EHV500

to define material dependent parameter sets. A common base plate

control different source types and quantities. Our systems are engineered

with direct water cooling allows simple exchange between different

to control not only the latest generation gun bodies but also the robust

crucible arrangements adding further flexibility.

ESQ100 series gun bodies which remain industry favourites for many optical
and semiconductor applications. Custom retrofit packages of control
systems and gun bodies are available to give your existing BAK a new lease
of life.
Integration via Ethernet (HSMS SECS Protocol) allows the user full access
and control of the EEC from the Khan system and Process Controller.

Full integration within Evatecs Khan control platform makes for

simple selection of parameter sets by application engineers and
operators alike. Simultaneous source control for co deposition
and continuous source fed systems for are just a few of the custom
hardware solutions available to meet your production requirements.

100
100.0
Sweep Track

0.465
0.435
0.405
0.375
0.345
0.315
0.285
0.255
0.225
0.195
0.165
0.135
0.105
0.075
0.045
0.000

Speed factor:100

The ESQ212 series gun bodies developed for the EBS500 permit

unit and EHV500 10KV solid state power supplies. The ECS Deflector
package.

Versatile

Sweep track set

Y-Size

Filament

[%]

and

593mm

32 40

all with Evatec

process know how
Custom Crucible Options

Electron Beam
Deposition Technology

Pot crucible, volume according to request

4, 6, 8 and 16 pocket variants according to request

From simple Best Known Methods for evaporation of individual materials (BKMs) to

98mm

process specifications with uniformity calculations and system throughputs, Evatec

26mm

offersknow how to help you achieve optimised layer results with your EBS hardware.

160mm

But delivery of the E Gun is just the start, and Evatec delivers complete source and
process control solutions for a wide range of materials and applications.

176

205

118

Crucible

Broadband Optical Monitoring for

process control

Plasma sources for enhanced

layer properties

Extended throw geometries for SAW

About Us

40

Evatec offers complete solutions for thin film deposition and etch in the optical and
semiconductor markets. Evatec engineers are able to offer practical production advice
and solutions from R&D to prototyping and mass production. We recognize that no single
technique offers the solution to all problems. With a technology portfolio including standard

Metals Oxides SAW LEDs MEMS

Power Devices Optics Projection
Display Photovoltaics Sensors

and enhanced evaporation solutions as well as sputter, we are ready to offer sampling services
and custom engineering solutions to meet our customers individual needs.
We provide sales and service through our global network of local offices. For more information
visit us at www.evatecnet.com or contact our head office.

EBS

Evatec Ltd.
Lochrietstrasse 14
CH-8890 Flums
Switzerland
Tel: + 41 81 720 1080
Fax: + 41 81 720 1081
info@evatecnet.com
www.evatecnet.com

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.

and

593mm

32 40

all with Evatec

process know how
Custom Crucible Options

Electron Beam
Deposition Technology

Pot crucible, volume according to request

4, 6, 8 and 16 pocket variants according to request

From simple Best Known Methods for evaporation of individual materials (BKMs) to

98mm

process specifications with uniformity calculations and system throughputs, Evatec

26mm

offersknow how to help you achieve optimised layer results with your EBS hardware.

160mm

But delivery of the E Gun is just the start, and Evatec delivers complete source and
process control solutions for a wide range of materials and applications.

176

205

118

Crucible

Broadband Optical Monitoring for

process control

Plasma sources for enhanced

layer properties

Extended throw geometries for SAW

About Us

40

Evatec offers complete solutions for thin film deposition and etch in the optical and
semiconductor markets. Evatec engineers are able to offer practical production advice
and solutions from R&D to prototyping and mass production. We recognize that no single
technique offers the solution to all problems. With a technology portfolio including standard

Metals Oxides SAW LEDs MEMS

Power Devices Optics Projection
Display Photovoltaics Sensors

and enhanced evaporation solutions as well as sputter, we are ready to offer sampling services
and custom engineering solutions to meet our customers individual needs.
We provide sales and service through our global network of local offices. For more information
visit us at www.evatecnet.com or contact our head office.

EBS

Evatec Ltd.
Lochrietstrasse 14
CH-8890 Flums
Switzerland
Tel: + 41 81 720 1080
Fax: + 41 81 720 1081
info@evatecnet.com
www.evatecnet.com

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.