This document provides information about titanium tetrachloride (TiCl4), which is commonly used as a precursor for depositing titanium nitride (TiN) thin films via chemical vapor deposition (CVD) or atomic layer deposition (ALD). TiCl4 is a colorless liquid with a boiling point of 136.5°C that reacts violently with water. It can be delivered via bubbler or direct liquid injection for CVD or ALD processes. Air Liquide offers high-purity TiCl4 in sealed canisters for use as a TiN precursor.
This document provides information about titanium tetrachloride (TiCl4), which is commonly used as a precursor for depositing titanium nitride (TiN) thin films via chemical vapor deposition (CVD) or atomic layer deposition (ALD). TiCl4 is a colorless liquid with a boiling point of 136.5°C that reacts violently with water. It can be delivered via bubbler or direct liquid injection for CVD or ALD processes. Air Liquide offers high-purity TiCl4 in sealed canisters for use as a TiN precursor.
This document provides information about titanium tetrachloride (TiCl4), which is commonly used as a precursor for depositing titanium nitride (TiN) thin films via chemical vapor deposition (CVD) or atomic layer deposition (ALD). TiCl4 is a colorless liquid with a boiling point of 136.5°C that reacts violently with water. It can be delivered via bubbler or direct liquid injection for CVD or ALD processes. Air Liquide offers high-purity TiCl4 in sealed canisters for use as a TiN precursor.
This document provides information about titanium tetrachloride (TiCl4), which is commonly used as a precursor for depositing titanium nitride (TiN) thin films via chemical vapor deposition (CVD) or atomic layer deposition (ALD). TiCl4 is a colorless liquid with a boiling point of 136.5°C that reacts violently with water. It can be delivered via bubbler or direct liquid injection for CVD or ALD processes. Air Liquide offers high-purity TiCl4 in sealed canisters for use as a TiN precursor.
TiN is widely used as a diffusion barrier layer or as an inorganic ARC for lithography on top of aluminum metal. TiCl4 in conjunction with ammonia is the most common TiN precursor for contact layer barrier prior to CVD W metallization and for capacitor electrode in DRAM devices. TiCl4 is volatile liquid at room temperature and can be delivered either by bubbler or direct liquid injection for LP-CVD or ALD processes. Air Liquide’s high purity TiCl4 has extremely tight metal specification for higher yield and process performance.
Main application: LP-CVD and ALD of Titanium nitride
Physical-chemical properties Physical Property Molecular Weight 189.7 g.mol-1 Physical State Liquid Melting point -24°C Boiling Point 136.5°C Vapor Pressure 9 Torr at 20°C Liquid Density 1.73 g.cm-3 at 0°C Viscosity 0.83 cSt at 20°C
www.aloha.airliquide.com FICHES AL Aloha 1/09/05 17:42 Page 4
AL Specifications
Element Unit (ppb) Element Unit (ppb) Hazard Rating Ag <1 Mn <1 HMIS: Health: 3 Flammability: 0 Reactivity: 2 Al <2 Mo <1 Au <1 Na <2 Ba <1 Ni <1 Be <1 Pb <1 0 Bi <1 Sb <1 Ca <1 Sn <1 3 2 Cd <1 Sr <1 Co <1 V <1 COR Cr <1 Zn <5 Cu <2 Zr <1 Fe <3 As <2
Ga <1 Hg <1
K <1 Th <1
Li <1 U <2
Mg <2
Handling TiCl4 is a corrosive, non flammable, stable liquid and does not thermally decomposes under inert atmosphere at room temperature. It reacts spontaneously and vigorously with water or trace moisture, with evolution of HCl. Extreme care must be taken to completely dry the distribution systems and canister connexions before and after exposure to TiCl4.
TiCl4 can be distributed in UHP stainless steel distribution systems. Sealing materials that is compatible with TiCl4 are PCTFE, PTFE, PVDF, PFA, FEP. Kalrez (O-ring) should be avoided.
Packaging & Dispensing system
TiCl4 is typically delivered using a liquid dispensing system such as Air Liquide's CANDI system on most OEM platforms. CANDI has distinctive, patent pending features, such as a “last drop usage” function that avoids the usage of an internal liquid level sensing system.
TiCl4 is available in SEMIF66-1101 and F 96-0704 compliant canisters of 5 Gallons and 2 Gallons (18,9L and 7,6L) equipped with manually or pneumatically valves actuated valves. Custom packages are also available on request.
Transport information July 2005
Proper shipping name: Titanium tetrachloride
CAS n° 7550-45-0 UN Number: 1838 Class/Division: 8 Package group: II Label ADR: 8
Air Liquide ALOHA provides a complete advanced precursor solution.
AL ALOHA portfolio covers low k, high k, barrier, metal gate, electrode, including some proprietary solutions.
For more information please contact: aloha@airliquide.com or your local Air Liquide representative
"Manufacturing electronic devices with this material may be claimed in certain patents and seller hereby disclaims any liability as to the use of this material made by buyer"
Hou-Cheng Huang PHD, BSC, MSC, Asif S. Usmani PHD, BE, MS (Auth.) - Finite Element Analysis For Heat Transfer - Theory and Software-Springer-Verlag London (1994) PDF
