Chapter-9 금속반도체결함 및 이종결합
Chapter-9 금속반도체결함 및 이종결합
Chapter-9 금속반도체결함 및 이종결합
Metal-Semiconductor and
Semiconductor Heterojunctions
Qualitative Characteristics
фm : metal work function
фs : semiconductor work function
χ : electron affinity
: Built-in potential Barrier : for electron in semiconductor side to flow into metal
← E ( x =xn ) =0
-
n ← φ ( x = xn ) = 0
eN d xn2
V= φ (= =
x 0) ⋅
bi
εs 2 : same as the one-sided
p+n junction
(reversed-biased case)
Example 9.1 A contact between Tungsten and n-type silicon doped to Nd = 1016cm-3 at T = 300K.
: Image force
No electric field :
−eφ ( x) =
dφ e
For max. barrier : =− +E=0
dx 16πε s x 2
e eE
∆φ =−φ ( x =xm ) =− − Exm =
16πε s xm 4πε s
Δф increases with an
increase in the applied
reverse-bias voltage
more reverse
saturation current.
N-type
Forward biased
Before contact At equilibrium after contact for фm < фs
P-type
Reverse biased
At equilibrium after contact for фm > фs
Tunneling Barrier
Contact
Resistance :
Heterojunction
Two semiconductor materials with different bandgap but nearly matched lattice constants.
nP
Hetero
junction
nN
Hetero
junction 2-D Electron Gas